high-speed non-volatile flash memory device exhibiting multibit data storage operations
Author: Ghulam Dastgeer (Prof. Dr)
Published: 2025-12-04
Outcome: positive
Abstract
Non-volatile memory devices, which offer large capacity and mechanical dependability as a mainstream technology, have played a key role in fostering innovation in modern electronics. Despite the advantages of non-volatile memory devices, their low ON/OFF ratio and slow operational speed have limited
Full text
Non-volatile memory devices, which offer large capacity and mechanical dependability as a mainstream technology, have played a key role in fostering innovation in modern electronics. Despite the advantages of non-volatile memory devices, their low ON/OFF ratio and slow operational speed have limited their performance compared to their volatile counterparts. In this study, we present a non-volatile floating-gate memory device based on van der Waals heterostructures, which exhibits ultrahigh-speed memory operations in the range of a hundred nanoseconds with an extinction ratio of up to 106. The device consists of atomically sharp interfaces between different functional elements, including atomically thin sheet of multilayer Graphene (MGr) as a floating gate, hexagonal boron nitride (h-BN) as a tunnel barrier, and two-dimensional (2D) semiconductor tin di-selenide (SnSe2) as a channel material **Key Findings:** Non-volatile memory devices, which offer large capacity and mechanical dependability as a mainstream technology, have played a key role in fostering innovation in modern electronics. Despite the advantages of non-volatile memory devices, their low ON/OFF ratio and slow operational speed have limited their performance compared to their volatile counterparts. In this study, we present a non-volatile floating-gate memory device based on van der Waals heterostructures, which exhibits ultrahigh-speed memory operations in the range of a hundred nanoseconds with an extinction ratio of up to 106. The device consists of atomically sharp interfaces between different functional elements, including atomically thin sheet of multilayer Graphene (MGr) as a floating gate, hexagonal boron nitride (h-BN) as a tunnel barrier, and two-dimensional (2D) semiconductor tin di-selenide (SnSe2) as a channel material